Area-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition.
| Title: | Area-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition. |
| Author: | Kim, Jung-Sik |
| Advisors: | Gregory Parsons, Chair Jan Genzer, Member Harold Lamb, Member Divine Kumah, Member |
| Date: | 2022-05-31 |
| Degree: | Doctor of Philosophy |
| Discipline: | Chemical Engineering |
| URI: | https://www.lib.ncsu.edu/resolver/1840.20/39720 |
Files in this item
| Files | Size | Format | View |
|---|---|---|---|
| etd.pdf | 7.547Mb |
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