Area-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition.

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dc.contributor.advisor Gregory Parsons, Chair
dc.contributor.advisor Jan Genzer, Member
dc.contributor.advisor Harold Lamb, Member
dc.contributor.advisor Divine Kumah, Member
dc.contributor.author Kim, Jung-Sik
dc.date.accessioned 2022-06-21T12:30:31Z
dc.date.available 2022-06-21T12:30:31Z
dc.date.issued 2022-05-31
dc.date.submitted 2022-06-01
dc.identifier.other deg29861
dc.identifier.uri https://www.lib.ncsu.edu/resolver/1840.20/39720
dc.title Area-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition.
dc.degree.name Doctor of Philosophy
dc.degree.level dissertation
dc.degree.discipline Chemical Engineering
dc.date.accepted 2022-06-17
dc.date.defense 2022-05-31
dc.date.released 2022-06-21
dc.date.reviewed 2022-06-13


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