Achieving uniformity in a semiconductor fabrication process using spatial modeling

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dc.contributor.author Hughes-Oliver, Jacqueline M.
dc.contributor.author Lu, Jye-Chyi
dc.contributor.author Davis, J. C.
dc.contributor.author Gyurcsik, Ronald S.
dc.date.accessioned 2014-11-19T16:33:21Z
dc.date.available 2014-11-19T16:33:21Z
dc.date.issued 1995
dc.identifier.uri http://www.stat.ncsu.edu/information/library/mimeo.archive/ISMS_1995_2277.pdf
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.4/8510
dc.format.extent 657874 bytes
dc.format.mimetype application/pdf
dc.format.mimetype application/pdf
dc.language.iso en
dc.publisher North Carolina State University. Dept. of Statistics
dc.relation.ispartofseries Institute of Statistics mimeo series
dc.relation.ispartofseries 2277
dc.title Achieving uniformity in a semiconductor fabrication process using spatial modeling
dc.type Technical report


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