Electron trapping in noncrystalline remote plasma deposited Hf- aluminate alloys for gate dielectric applications
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2002
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Johnson, R. S., Hong, J. G., Hinkle, C., & Lucovsky, G. (2002). Electron trapping in noncrystalline remote plasma deposited Hf- aluminate alloys for gate dielectric applications. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 20(3), 1126-1131.
