Deposition of Metal and Metal Oxide Thin Films from Metal Organic Precursors in Supercritical Carbon Dioxide Solution

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dc.contributor.advisorRuben G. Carbonell, Committee Memberen_US
dc.contributor.advisorGregory N. Parsons, Committee Chairen_US
dc.contributor.advisorCarlton Osburn, Committee Memberen_US
dc.contributor.authorBarua, Dipaken_US
dc.date.accessioned2010-04-02T17:57:16Z
dc.date.available2010-04-02T17:57:16Z
dc.date.issued2005-04-22en_US
dc.degree.disciplineChemical Engineeringen_US
dc.degree.levelthesisen_US
dc.degree.nameMSen_US
dc.description.abstractThin films of metals and metal-oxides are deposited in batch (Chemical Fluid Deposition) and cyclic (Atomic Layer Deposition) processes from metal organic precursors in supercritical carbon dioxide solutions. New materials have been introduced in the deposition processes. Deposited films are analyzed in details in order to evaluate their quality and chemical composition. Analyzing techniques, X-ray photoelectron spectroscopy (XPS), ellipsometry, Fourier transform infrared spectroscopy (FTIR), atomic force microscopy (AFM), and auger electron spectroscopy (AES) are adopted to characterize the films. Capacitance-voltage measurements are performed to prove the device quality deposition of metal oxide films. The process establishes a new approach in metal oxide deposition, and controllable growth of metal and metal oxide films in supercritical carbon dioxide.en_US
dc.identifier.otheretd-04222005-000549en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/628
dc.rightsI hereby certify that, if appropriate, I have obtained and attached hereto a written permission statement from the owner(s) of each third party copyrighted matter to be included in my thesis, dissertation, or project report, allowing distribution as specified below. I certify that the version I submitted is the same as that approved by my advisory committee. I hereby grant to NC State University or its agents the non-exclusive license to archive and make accessible, under the conditions specified below, my thesis, dissertation, or project report in whole or in part in all forms of media, now or hereafter known. I retain all other ownership rights to the copyright of the thesis, dissertation or project report. I also retain the right to use in future works (such as articles or books) all or part of this thesis, dissertation, or project report.en_US
dc.subjectCFDen_US
dc.subjectGate Metalen_US
dc.subjectALDen_US
dc.subjectSc CO2en_US
dc.subjectThin Film Depositionen_US
dc.subjectHigh k Dielectricen_US
dc.titleDeposition of Metal and Metal Oxide Thin Films from Metal Organic Precursors in Supercritical Carbon Dioxide Solutionen_US

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