High-Rate Diamond Deposition by Microwave Plasma CVD

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dc.contributor.advisorZlatko Sitar, Committee Chairen_US
dc.contributor.advisorRamon Collazo, Committee Memberen_US
dc.contributor.advisorGerd Duscher, Committee Memberen_US
dc.contributor.advisorCarl Osburn, Committee Memberen_US
dc.contributor.authorLi, Xianglinen_US
dc.date.accessioned2010-04-02T18:52:00Z
dc.date.available2010-04-02T18:52:00Z
dc.date.issued2008-08-01en_US
dc.degree.disciplineMaterials Science and Engineeringen_US
dc.degree.leveldissertationen_US
dc.degree.namePhDen_US
dc.description.abstracten_US
dc.identifier.otheretd-04222008-135738en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/4343
dc.rightsI hereby certify that, if appropriate, I have obtained and attached hereto a written permission statement from the owner(s) of each third party copyrighted matter to be included in my thesis, dis sertation, or project report, allowing distribution as specified below. I certify that the version I submitted is the same as that approved by my advisory committee. I hereby grant to NC State University or its agents the non-exclusive license to archive and make accessible, under the conditions specified below, my thesis, dissertation, or project report in whole or in part in all forms of media, now or hereafter known. I retain all other ownership rights to the copyright of the thesis, dissertation or project report. I also retain the right to use in future works (such as articles or books) all or part of this thesis, dissertation, or project report.en_US
dc.subjectHigh rate growthen_US
dc.subjectDiamonden_US
dc.subjectDepositionen_US
dc.titleHigh-Rate Diamond Deposition by Microwave Plasma CVDen_US

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