Method for fabricating transistor gate structures and gate dielectrics thereof

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dc.date.accessioned2008-10-14T16:03:38Z
dc.date.available2008-10-14T16:03:38Z
dc.date.issued2006
dc.format.extent150429 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationVisokay, M. R., Colombo, L., Chambers, J. J., Rotondaro, A. L., & Bu, H. (2006). Method for fabricating transistor gate structures and gate dielectrics thereof. U.S. Patent No. 7,135,361. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/1399
dc.language.isoen
dc.titleMethod for fabricating transistor gate structures and gate dielectrics thereof
dc.typePatent

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