Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements

Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements

Files

lucovsky_1998_journal_vacuum_science_tech_A_1525.pdf (78.46 KB)

Date

1998

Citation

Yang, H., & Lucovsky, G. (1998). Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(3 (part 2)), 1525-1528.