Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride
No Thumbnail Available
Date
2001
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Boehme, C., & Lucovsky, G. (2001). Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 19(5), 2622-2628.