Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride

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dc.date.accessioned2008-02-22T23:23:24Z
dc.date.available2008-02-22T23:23:24Z
dc.date.issued2001
dc.format.extent119626 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationBoehme, C., & Lucovsky, G. (2001). Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 19(5), 2622-2628.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/257
dc.language.isoen
dc.titleDissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride
dc.typeArticle

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