Method for improving inversion layer mobility in a silicon carbide metal-oxide semiconductor field-effect transistor
No Thumbnail Available
Date
2003
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Alok, D., Arnold, E., Egloff, R., & Mukherjee, S. (2003). Method for improving inversion layer mobility in a silicon carbide metal-oxide semiconductor field-effect transistor. U.S. Patent No. 6,559,068. Washington, DC: U.S. Patent and Trademark Office.