Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition

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dc.date.accessioned2008-02-27T20:10:31Z
dc.date.available2008-02-27T20:10:31Z
dc.date.issued1986
dc.format.extent983221 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationPai, P. G., Chao, S. S., Takagi, Y., & Lucovsky, G. (1986). Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 4(3), 689-694.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/290
dc.language.isoen
dc.titleInfrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition
dc.typeArticle

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