Differences between charge trapping states in irradiated nano-crystalline HfO2 and non-crystalline Hf silicates

No Thumbnail Available

Date

2002

Authors

Advisors

Journal Title

Series/Report No.

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

Citation

Lucovsky, G., Fleetwood, D. M., Lee, S., Seo, H., Schrimpf, R. D., Felix, J. A., Luning, J., Fleming, L. B., Ulrich, M., & Aspnes, D. E. (2006). Differences between charge trapping states in irradiated nano-crystalline HfO2 and non-crystalline Hf silicates. IEEE transactions on nuclear science, 53(6), 3644-3648.

Degree

Discipline

Collections