Differences between charge trapping states in irradiated nano-crystalline HfO2 and non-crystalline Hf silicates

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dc.date.accessioned2008-03-03T20:30:45Z
dc.date.available2008-03-03T20:30:45Z
dc.date.issued2002
dc.format.extent345582 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationLucovsky, G., Fleetwood, D. M., Lee, S., Seo, H., Schrimpf, R. D., Felix, J. A., Luning, J., Fleming, L. B., Ulrich, M., & Aspnes, D. E. (2006). Differences between charge trapping states in irradiated nano-crystalline HfO2 and non-crystalline Hf silicates. IEEE transactions on nuclear science, 53(6), 3644-3648.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/403
dc.language.isoen
dc.titleDifferences between charge trapping states in irradiated nano-crystalline HfO2 and non-crystalline Hf silicates
dc.typeArticle

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