FINAL Microstructure-Property Study of Cu1-xTax Thin Films

Abstract

A series of Cu1-xTax (x = 0.05 to 0.5) thin films have been produced by DC magnetron sputter deposition using co-deposition (alloy) and sequential (layered) deposition modes at ambient temperature. The nanoscale microstructures of these non-equilibrium "alloy" films have been investigated chemically and structurally using x-ray diffraction, scanning electron microscopy and high-resolution transmission electron microscopy. The mechanical properties were measured via nanotriboligical and nanoindentation studies of selected samples to determine the affect of Ta composition and nanolayer thickness.