Investigations of Atomic Layer Deposition and Thermal Atomic Layer Etching: Nucleation Trends, Area-Selectivity, and Phase Change Memory Materials.

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dc.contributor.advisorGregory Parsons, Chair
dc.contributor.advisorDavid Aspnes, Member
dc.contributor.advisorDivine Kumah, Member
dc.contributor.advisorMichael Dickey, Member
dc.contributor.authorSaare, Holger
dc.date.accepted2021-09-07
dc.date.accessioned2021-09-08T12:30:19Z
dc.date.available2021-09-08T12:30:19Z
dc.date.defense2021-08-23
dc.date.issued2021-08-23
dc.date.released2021-09-08
dc.date.reviewed2021-08-30
dc.date.submitted2021-08-25
dc.degree.disciplinePhysics
dc.degree.leveldissertation
dc.degree.nameDoctor of Philosophy
dc.identifier.otherdeg26897
dc.identifier.urihttps://www.lib.ncsu.edu/resolver/1840.20/39075
dc.titleInvestigations of Atomic Layer Deposition and Thermal Atomic Layer Etching: Nucleation Trends, Area-Selectivity, and Phase Change Memory Materials.

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