Thermal stability of plasma-nitrided aluminum oxide films on Si

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dc.date.accessioned2008-02-23T16:41:59Z
dc.date.available2008-02-23T16:41:59Z
dc.date.issued2004
dc.format.extent59538 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationBastos, K. P., Pezzi, R. P., Miotti, L., Soares, G. V., Driemeier, C., Morais, J., Baumvol, I. J. R., Hinkle, C., & Lucovsky, G. (2004). Thermal stability of plasma-nitrided aluminum oxide films on Si. Applied physics letters, 84(1), 97-99.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/271
dc.language.isoen
dc.titleThermal stability of plasma-nitrided aluminum oxide films on Si
dc.typeArticle

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