Atomic Layer Deposition (ALD) Enabled Techniques for Novel Memory Applications.

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dc.contributor.advisorVeena Misra, Chair
dc.contributor.advisorPaul Franzon, Member
dc.contributor.advisorJohn Muth, Member
dc.contributor.advisorMichael Dickey, Member
dc.contributor.authorSarkar, Biplab
dc.date.accepted2015-11-09
dc.date.accessioned2016-11-12T13:32:08Z
dc.date.available2016-11-12T13:32:08Z
dc.date.defense2015-08-11
dc.date.embargo2016-11-12
dc.date.issued2015-08-11
dc.date.released2016-11-12
dc.date.reviewed2015-11-02
dc.date.submitted2015-10-26
dc.degree.disciplineElectrical Engineering
dc.degree.leveldissertation
dc.degree.nameDoctor of Philosophy
dc.identifier.otherdeg4726
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.20/33262
dc.rights
dc.titleAtomic Layer Deposition (ALD) Enabled Techniques for Novel Memory Applications.

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