Thermal stability of TiO2, ZrO2, or HfO2 on Si(100) by photoelectron emission microscopy
No Thumbnail Available
Date
2006
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Zeman, M. C., Fulton, C. C., Lucovsky, G., Nemanich, R. J., & Yang, W. C. (2006). Thermal stability of TiO2, ZrO2, or HfO2 on Si(100) by photoelectron emission microscopy. Journal of applied physics, 99(2).
