Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface

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dc.date.accessioned2008-02-20T19:00:48Z
dc.date.available2008-02-20T19:00:48Z
dc.date.issued2003
dc.format.extent161995 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationYang, W. C., Zeman, M., Ade, H., & Nemanich, R. J. (2003). Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface. Physical review letters, 90(13), 136102-1.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/133
dc.language.isoen
dc.titleAttractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface
dc.typeArticle

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