Characteristics of Replacement Lithography and Desorption on Various Metal Substrates
| dc.contributor.advisor | Dr. Stefan Franzen, Committee Member | en_US |
| dc.contributor.advisor | Dr. Edmond F. Bowden, Committee Member | en_US |
| dc.contributor.advisor | Dr. Christopher B. Gorman, Committee Chair | en_US |
| dc.contributor.author | Williams, James Alfred | en_US |
| dc.date.accessioned | 2010-04-02T17:55:20Z | |
| dc.date.available | 2010-04-02T17:55:20Z | |
| dc.date.issued | 2004-07-06 | en_US |
| dc.degree.discipline | Chemistry | en_US |
| dc.degree.level | thesis | en_US |
| dc.degree.name | MS | en_US |
| dc.description.abstract | The development of molecular electronic systems relies on the investigation of metal/molecule interactions. A popular methodology to forming metal/molecule interfaces uses the formation of self-assembled monolayers (SAMs), SAMs are capable of forming consistent, well order single to multiple layers of molecules oriented with respect to surface characteristics. While a plethora of techniques exist for exploring this phenomenon the utilization of replacement lithography presents a systematic approach to investigating the formation and stability of SAMs on various substrates. However, in authenticating investigations using lithographic techniques, the employment of electrochemistry forms conclusions on desorption and adsorption characteristics of the SAMs. While contemplating the contribution posed by metal/molecule interactions the facilitation of comparative methodologies in rationalizing processes of altering the characteristics of the monolayers, provides a speculative vantage of future endeavors into the development of molecular electronics. | en_US |
| dc.identifier.other | etd-04072004-090733 | en_US |
| dc.identifier.uri | http://www.lib.ncsu.edu/resolver/1840.16/425 | |
| dc.rights | I hereby certify that, if appropriate, I have obtained and attached hereto a written permission statement from the owner(s) of each third party copyrighted matter to be included in my thesis, dissertation, or project report, allowing distribution as specified below. I certify that the version I submitted is the same as that approved by my advisory committee. I hereby grant to NC State University or its agents the non-exclusive license to archive and make accessible, under the conditions specified below, my thesis, dissertation, or project report in whole or in part in all forms of media, now or hereafter known. I retain all other ownership rights to the copyright of the thesis, dissertation or project report. I also retain the right to use in future works (such as articles or books) all or part of this thesis, dissertation, or project report. | en_US |
| dc.subject | STM | en_US |
| dc.subject | Replacement Lithography | en_US |
| dc.subject | metal substrates | en_US |
| dc.title | Characteristics of Replacement Lithography and Desorption on Various Metal Substrates | en_US |
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