Plasma-assisted formation of low defect density SiC-SiO2 interfaces
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1997
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Golz, A., Lucovsky, G., Koh, K., Wolfe, D., Niimi, H., & Kurz, H. (1997). Plasma-assisted formation of low defect density SiC-SiO2 interfaces. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 15(4), 1097-1104.
