Plasma-assisted formation of low defect density SiC-SiO2 interfaces

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dc.date.accessioned2008-02-22T23:25:34Z
dc.date.available2008-02-22T23:25:34Z
dc.date.issued1997
dc.format.extent158276 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationGolz, A., Lucovsky, G., Koh, K., Wolfe, D., Niimi, H., & Kurz, H. (1997). Plasma-assisted formation of low defect density SiC-SiO2 interfaces. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 15(4), 1097-1104.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/259
dc.language.isoen
dc.titlePlasma-assisted formation of low defect density SiC-SiO2 interfaces
dc.typeArticle

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