Selective germanium deposition on silicon and resulting structures

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dc.date.accessioned2008-07-28T20:42:41Z
dc.date.available2008-07-28T20:42:41Z
dc.date.issued1992
dc.format.extent82835 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationOzturk, M., Wortman, J., & Grider, D. (1992). Selective germanium deposition on silicon and resulting structures. U.S. Patent No. 5,162,246. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/1238
dc.language.isoen
dc.titleSelective germanium deposition on silicon and resulting structures
dc.typePatent

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