Method for reducing physisorption during atomic layer deposition
No Thumbnail Available
Date
2004
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Gealy, F. D., & Basceri, C. (2004). Method for reducing physisorption during atomic layer deposition. U.S. Patent No. 6,784,083. Washington, DC: U.S. Patent and Trademark Office.
