Method for reducing physisorption during atomic layer deposition

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dc.date.accessioned2008-10-16T18:45:52Z
dc.date.available2008-10-16T18:45:52Z
dc.date.issued2004
dc.format.extent100956 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationGealy, F. D., & Basceri, C. (2004). Method for reducing physisorption during atomic layer deposition. U.S. Patent No. 6,784,083. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/1708
dc.language.isoen
dc.titleMethod for reducing physisorption during atomic layer deposition
dc.typePatent

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