Passivated silicon carbide devices with low leakage current and method of fabricating

dc.date.accessioned2008-10-16T16:56:01Z
dc.date.available2008-10-16T16:56:01Z
dc.date.issued2002
dc.format.extent129839 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationAlok, D., & Arnold, E. (2002). Passivated silicon carbide devices with low leakage current and method of fabricating. U.S. Patent No. 6,373,076. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/1674
dc.language.isoen
dc.titlePassivated silicon carbide devices with low leakage current and method of fabricating
dc.typePatent

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