compensator control for chemical vapor deposition film growth using reduced order design models

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dc.contributor.authorKepler, Grace M.
dc.contributor.authorTran, Hien T.
dc.contributor.authorBanks, Harvey Thomas
dc.date.accessioned2006-11-14T12:46:01Z
dc.date.available2006-11-14T12:46:01Z
dc.date.issued1999
dc.format.extent487297 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://www.ncsu.edu/crsc/reports/ftp/pdf/crsc-tr99-41.pdf
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.4/663
dc.language.isoen
dc.publisherNorth Carolina State University. Center for Research in Scientific Computation
dc.relation.ispartofseriesCRSC-TR99-41
dc.relation.ispartofseriesCenter for Research in Scientific Computation Technical Report
dc.titlecompensator control for chemical vapor deposition film growth using reduced order design models
dc.typeTechnical report

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