Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

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dc.date.accessioned2008-02-22T23:21:47Z
dc.date.available2008-02-22T23:21:47Z
dc.date.issued2002
dc.format.extent131462 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationKhandelwal, A., Niimi, H., Lucovsky, G., & Lamb, H. H. (2002). Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 20(6), 1989-1996.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/256
dc.language.isoen
dc.titleLow-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films
dc.typeArticle

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