Method of etching a substantially amorphous TA2O5 comprising layer
| dc.date.accessioned | 2008-10-14T16:29:49Z | |
| dc.date.available | 2008-10-14T16:29:49Z | |
| dc.date.issued | 2003 | |
| dc.format.extent | 137469 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.identifier.citation | Basceri, C., Derderian, G. J., Visokay, M. R., Drynan, J. M., & Sandhu, G. S. (2003). Method of etching a substantially amorphous TA2O5 comprising layer. U.S. Patent No. 6,511,896. Washington, DC: U.S. Patent and Trademark Office. | |
| dc.identifier.uri | http://www.lib.ncsu.edu/resolver/1840.2/1427 | |
| dc.language.iso | en | |
| dc.title | Method of etching a substantially amorphous TA2O5 comprising layer | |
| dc.type | Patent |
