Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD
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1995
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Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. (1995). Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD. U.S. Patent No. 5,403,779. Washington, DC: U.S. Patent and Trademark Office.
