Depth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces

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dc.date.accessioned2008-02-22T22:43:23Z
dc.date.available2008-02-22T22:43:23Z
dc.date.issued2000
dc.format.extent86831 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationBrillson, L. J., Young, A. P., White, B. D., Schafer, J., Niimi, H., Lee, Y. M., & Lucovsky, G. (2000). Depth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 18(3), 1737-1741.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/237
dc.language.isoen
dc.titleDepth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces
dc.typeArticle

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