Area-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition.

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dc.contributor.advisorGregory Parsons, Chair
dc.contributor.advisorJan Genzer, Member
dc.contributor.advisorHarold Lamb, Member
dc.contributor.advisorDivine Kumah, Member
dc.contributor.authorKim, Jung-Sik
dc.date.accepted2022-06-17
dc.date.accessioned2022-06-21T12:30:31Z
dc.date.available2022-06-21T12:30:31Z
dc.date.defense2022-05-31
dc.date.issued2022-05-31
dc.date.released2022-06-21
dc.date.reviewed2022-06-13
dc.date.submitted2022-06-01
dc.degree.disciplineChemical Engineering
dc.degree.leveldissertation
dc.degree.nameDoctor of Philosophy
dc.identifier.otherdeg29861
dc.identifier.urihttps://www.lib.ncsu.edu/resolver/1840.20/39720
dc.titleArea-Selective Deposition of Organic/Inorganic Materials by Atomic Layer Deposition, Molecular Layer Deposition and Chemical Vapor Deposition.

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