High dielectric constant metal silicates formed by controlled metal-surface reactions

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dc.date.accessioned2008-07-23T18:50:06Z
dc.date.available2008-07-23T18:50:06Z
dc.date.issued2003
dc.format.extent73584 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationParsons, G. N., Chambers, J. J., & Kelly, M. J. (2003). High dielectric constant metal silicates formed by controlled metal-surface reactions. U.S. Patent No. 6,521,911. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/952
dc.language.isoen
dc.titleHigh dielectric constant metal silicates formed by controlled metal-surface reactions
dc.typePatent

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