Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy

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dc.date.accessioned2008-10-24T17:21:32Z
dc.date.available2008-10-24T17:21:32Z
dc.date.issued1996
dc.format.extent323365 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationBachmann, K. J., Dietz, N., & Miller, A. E. (1996). Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy. U.S. Patent No. 5552327. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/1876
dc.language.isoen
dc.titleMethods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
dc.typePatent

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