Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon
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1998
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Schafer, J., Young, A. P., Brillson, L. J., Niimi, H., & Lucovsky, G. (1998). Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon. Applied physics letters, 73(6), 791-793.
