Germanium-on-Silicon Strain Engineered Materials for Improved Device Performance Grown by Chemical Vapor Deposition.

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dc.contributor.advisorGeorge Rozgonyi, Chairen_US
dc.contributor.advisorJagdish Narayan, Memberen_US
dc.contributor.advisorJerome Cuomo, Memberen_US
dc.contributor.advisorMehmet Ozturk, Memberen_US
dc.contributor.advisorRama Venkatasubramanian, Externalen_US
dc.contributor.authorBharathan, Jayesh Moorkothen_US
dc.date.accepted2013-09-11en_US
dc.date.accessioned2014-09-21T09:30:13Z
dc.date.available2014-09-21T09:30:13Z
dc.date.defense2013-09-06en_US
dc.date.embargo2014-09-21en_US
dc.date.issued2013-09-06en_US
dc.date.released2014-09-21en_US
dc.date.reviewed2013-09-09en_US
dc.date.submitted2013-09-08en_US
dc.degree.disciplineMaterial Science & Engineeringen_US
dc.degree.leveldissertationen_US
dc.degree.nameDoctor of Philosophyen_US
dc.identifier.otherdeg2955en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/9761
dc.rightsen_US
dc.titleGermanium-on-Silicon Strain Engineered Materials for Improved Device Performance Grown by Chemical Vapor Deposition.en_US

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