Synthesis and Field Emission Properties of Carbon Nanotube Films

Abstract

In this study, vertically aligned multiwalled carbon nanotube films were grown by microwave plasma chemical vapor deposition (MWCVD). Through controlling the thickness of the iron thin film, carbon nanotubes with different diameters were obtained. When the thickness of the iron layer was reduced to 0.3-0.5 nm, single-wall and double-wall nanotubes were obtained with a high areal density (~ 1012/cm2) and vertical alignment. Scanning electron microscopy, Raman spectroscopy and high resolution transmission electron microscopy were employed to characterize the as-deposited nanotubes. In addition, a systematic study of the internal structure transition of the carbon nanotubes has been conducted and a growth model was proposed in terms of carbon surface and bulk diffusion.

The field emission of the carbon nanotube films has also been explored in this study. Different measurement systems including a variable distance field emission system, a field emission imaging system, and a field electron emission system (FEEM) were employed. The effects of the diameter (multi-wall vs single- and double- wall), the adsorbates, and the temperature on the field emission properties of carbon nanotubes have been exhibited. Finally, two processes including hydrogen plasma etching and re-growth were used to treat the as-deposited film, and an increased emission site density was observed for the re-grown carbon nanotube film.