Molecular Dynamics Simulation in Plasma Etching.

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dc.contributor.advisorSteven Shannon, Chair
dc.contributor.advisorMark Kushner, External
dc.contributor.advisorJacob Eapen, Member
dc.contributor.advisorYaroslava Yingling, Member
dc.contributor.advisorMohamed Bourham, Member
dc.contributor.authorDu, Yao
dc.date.accepted2023-03-28
dc.date.accessioned2023-04-04T12:30:35Z
dc.date.available2023-04-04T12:30:35Z
dc.date.defense2023-03-06
dc.date.issued2023-03-06
dc.date.released2023-04-04
dc.date.reviewed2023-03-15
dc.date.submitted2023-03-13
dc.degree.disciplineNuclear Engineering
dc.degree.leveldissertation
dc.degree.nameDoctor of Philosophy
dc.identifier.otherdeg32494
dc.identifier.urihttps://www.lib.ncsu.edu/resolver/1840.20/40769
dc.titleMolecular Dynamics Simulation in Plasma Etching.

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