Chemical and strain effects on Boron-doped Si(100)

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dc.date.accessioned2008-02-28T22:50:05Z
dc.date.available2008-02-28T22:50:05Z
dc.date.issued1999
dc.format.extent2199707 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationRamamoorthy, M., Briggs, E. L., & Bernholc, J. (1999). Chemical and strain effects on Boron-doped Si(100). Physical review. B, Condensed matter and materials physics, 59(7), 4813-4821.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/364
dc.language.isoen
dc.titleChemical and strain effects on Boron-doped Si(100)
dc.typeArticle

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