High Throughput Atomic Layer Deposition Processes: High Pressure Operations, New Reactor Designs, and Novel Metal Processing.

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dc.contributor.advisorGregory Parsons, Chairen_US
dc.contributor.advisorMichael Dickey, Memberen_US
dc.contributor.advisorSaad Khan, Memberen_US
dc.contributor.advisorJesse Jur, Memberen_US
dc.contributor.authorMousa, Moatazbellah Mahmouden_US
dc.date.accepted2015-10-29en_US
dc.date.accessioned2015-10-30T09:02:39Z
dc.date.available2015-10-30T09:02:39Z
dc.date.defense2015-09-10en_US
dc.date.issued2015-09-10en_US
dc.date.released2015-10-30en_US
dc.date.reviewed2015-10-22en_US
dc.date.submitted2015-09-10en_US
dc.degree.disciplineChemical Engineeringen_US
dc.degree.leveldissertationen_US
dc.degree.nameDoctor of Philosophyen_US
dc.identifier.otherdeg4661en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/10637
dc.rightsen_US
dc.titleHigh Throughput Atomic Layer Deposition Processes: High Pressure Operations, New Reactor Designs, and Novel Metal Processing.en_US

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