Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures

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dc.date.accessioned2008-02-22T22:33:45Z
dc.date.available2008-02-22T22:33:45Z
dc.date.issued2003
dc.format.extent93773 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationUlrich, M. D., Hong, J. G., Rowe, J. E., Lucovsky, G., Chan, A. S. Y., Madey, T. E. (2003). Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 21(4), 1777-1782.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/228
dc.language.isoen
dc.titleSoft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures
dc.typeArticle

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