Integration of VO2 Films on Al2O3 and Si (100) Substrates: Structure-Property Correlations and Applications.

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dc.contributor.advisorJagdish Narayan, Committee Chairen_US
dc.contributor.advisorVeena Misra, Committee Memberen_US
dc.contributor.advisorJerome Cuomo, Committee Memberen_US
dc.contributor.advisorJohn Prater, Committee Memberen_US
dc.contributor.authorYang, Tsung-Hanen_US
dc.date.accepted2011-02-10en_US
dc.date.accessioned2011-02-11T08:00:28Z
dc.date.available2011-02-11T08:00:28Z
dc.date.defense2011-01-31en_US
dc.date.issued2011-01-31en_US
dc.date.released2011-02-11en_US
dc.date.reviewed2011-02-02en_US
dc.date.submitted2011-02-01en_US
dc.degree.disciplineMaterials Science and Engineeringen_US
dc.degree.leveldissertationen_US
dc.degree.nameDoctor of Philosophyen_US
dc.identifier.otherdeg572en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/6650
dc.titleIntegration of VO2 Films on Al2O3 and Si (100) Substrates: Structure-Property Correlations and Applications.en_US

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