Comparison of ultrathin SiO2/Si(100) and SiO2/Si(111) interfaces from soft x-ray photoelectron spectroscopy

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dc.date.accessioned2008-02-22T22:28:03Z
dc.date.available2008-02-22T22:28:03Z
dc.date.issued2006
dc.format.extent291365 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationUlrich, M. D., Rowe, J. E., Keister, J., Niimi, H., Fleming, L., & Lucovsky, G. (2006). Comparison of ultrathin SiO2/Si(100) and SiO2/Si(111) interfaces from soft x-ray photoelectron spectroscopy. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 24(4), 2132-2137.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/225
dc.language.isoen
dc.titleComparison of ultrathin SiO2/Si(100) and SiO2/Si(111) interfaces from soft x-ray photoelectron spectroscopy
dc.typeArticle

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