Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing

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dc.date.accessioned2008-02-27T20:02:42Z
dc.date.available2008-02-27T20:02:42Z
dc.date.issued1998
dc.format.extent207503 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationLucovsky, G., Niimi, H., Wu, Y., Parker, C. R., & Hauser, J. R. (1998). Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(3 pt.2), 1721-1729.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/285
dc.language.isoen
dc.titleOptimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing
dc.typeArticle

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