Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate

Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate

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Date

1979

Citation

Cuomo, J. J., Gambino, R. J., & Harper, J. M. (1979). Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate. U.S. Patent No. 4,132,614. Washington, DC: U.S. Patent and Trademark Office.