Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy

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dc.date.accessioned2008-02-23T16:47:53Z
dc.date.available2008-02-23T16:47:53Z
dc.date.issued1999
dc.format.extent159103 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationKeister, J. W., Rowe, J. E., Kolodziej, J. J., Niimi, H., Tao, H. S., Madey, T. E., & Lucovsky, G. (1999). Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 17(4), 1250-1257.
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.2/274
dc.language.isoen
dc.titleStructure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy
dc.typeArticle

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