Process for manufacturing dual work function metal gates in a microelectronics device
No Thumbnail Available
Date
2007
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Colombo, L., Chambers, J. J., & Visokay, M. R. (2007). Process for manufacturing dual work function metal gates in a microelectronics device. U.S. Patent No. 7,229,873. Washington, DC: U.S. Patent and Trademark Office.
