Atomic Layer Deposition for the Modification and Creation of Nanomaterials.

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dc.contributor.advisorGregory Parsons, Chairen_US
dc.contributor.advisorJames Bonner, Memberen_US
dc.contributor.advisorChih-Hao Chang, Memberen_US
dc.contributor.advisorJan Genzer, Memberen_US
dc.contributor.authorNeedham, Erinn Christineen_US
dc.date.accepted2016-07-13en_US
dc.date.accessioned2016-07-19T12:31:53Z
dc.date.available2016-07-19T12:31:53Z
dc.date.defense2016-06-24en_US
dc.date.issued2016-06-24en_US
dc.date.released2016-07-19en_US
dc.date.reviewed2016-06-30en_US
dc.date.submitted2016-06-24en_US
dc.degree.disciplineChemical Engineeringen_US
dc.degree.leveldissertationen_US
dc.degree.nameDoctor of Philosophyen_US
dc.identifier.otherdeg5369en_US
dc.identifier.urihttp://www.lib.ncsu.edu/resolver/1840.16/11347
dc.rightsen_US
dc.titleAtomic Layer Deposition for the Modification and Creation of Nanomaterials.en_US

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