Refractory metal-based electrodes for work function setting in semiconductor devices
| dc.date.accessioned | 2008-10-13T21:42:36Z | |
| dc.date.available | 2008-10-13T21:42:36Z | |
| dc.date.issued | 2006 | |
| dc.format.extent | 120635 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.identifier.citation | Rotondaro, A. L., Chambers, J. J., & Jain, A. (2006). Refractory metal-based electrodes for work function setting in semiconductor devices. U.S. Patent No. 7,098,516. Washington, DC: U.S. Patent and Trademark Office. | |
| dc.identifier.uri | http://www.lib.ncsu.edu/resolver/1840.2/1331 | |
| dc.language.iso | en | |
| dc.title | Refractory metal-based electrodes for work function setting in semiconductor devices | |
| dc.type | Patent |
